Plasma treatment helps reveal how molecular coatings dope silicon
Controlling dopant concentration near the silicon surface is increasingly important for ultrashallow junctions and nanoscale devices. Mixed monolayer doping (MMLD) offers a surface-chemistry-based approach in which dopant-containing molecules are mixed with nondopant molecules to tune the amount of...
Image: Phys.org
Controlling dopant concentration near the silicon surface is increasingly important for ultrashallow junctions and nanoscale devices. Mixed monolayer doping (MMLD) offers a surface-chemistry-based approach in which dopant-containing molecules are mixed with nondopant molecules to tune the amount of dopant available at the silicon surface before thermal diffusion.
Originally published at Phys.org
