Dark plasma regions reveal overlooked source of reactive atomic oxygen
Scientists from Tokyo Metropolitan University have found a way to make plasma more effective for its wide-ranging uses, from antimicrobial applications to surface conditioning in the semiconductor industry. They mapped the production of atomic oxygen, a key ingredient of oxygen plasma, while a high...
Image: Phys.org
Scientists from Tokyo Metropolitan University have found a way to make plasma more effective for its wide-ranging uses, from antimicrobial applications to surface conditioning in the semiconductor industry. They mapped the production of atomic oxygen, a key ingredient of oxygen plasma, while a high voltage was applied across oxygen gas.
Originally published at Phys.org
